Use este identificador para citar ou linkar para este item: http://repositorio.ufla.br/jspui/handle/1/55727
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Campo DCValorIdioma
dc.creatorDias, Guilherme Osvaldo-
dc.creatorLecarme, Olivier-
dc.creatorCordeiro, Julien-
dc.creatorPicard, Emmanuel-
dc.creatorPeyrade, David-
dc.date.accessioned2023-01-04T22:20:19Z-
dc.date.available2023-01-04T22:20:19Z-
dc.date.issued2022-03-
dc.identifier.citationDIAS, G. O. et al. Microscale white light emitters fabricated by two-photon polymerization lithography on functional resist. Microelectronic Engineering, [S. I.], v. 257, 111751, Mar. 2022. DOI: https://doi.org/10.1016/j.mee.2022.111751.pt_BR
dc.identifier.urihttps://doi.org/10.1016/j.mee.2022.111751pt_BR
dc.identifier.urihttp://repositorio.ufla.br/jspui/handle/1/55727-
dc.description.abstractMicrometric white light emitters were fabricated by applying two-photon polymerization (TPP) lithography to a chemically modified resist. Such a functional resist (FR) was doped with fluorescent molecules to turn it emitting into the whole visible region. The TPP has shown to be a versatile, low cost maskless technique capable to fabricate highly resolved structures in our FR's. The spectroscopic and chromaticity properties of the FR and fabricated microscale structures were investigated. Structures emitting high quality of white light were obtained and classified into two categories: physical and physiological white light emitters. Finally, a lifetime study was performed with the aim to apply such structures as light sources for on chip integrated photonic devices.pt_BR
dc.languageenpt_BR
dc.publisherElsevierpt_BR
dc.rightsrestrictAccesspt_BR
dc.sourceMicroelectronic Engineeringpt_BR
dc.subjectTwo-photon lithographypt_BR
dc.subjectMicrofabricationpt_BR
dc.subjectWhite emitterspt_BR
dc.subjectPhotonicspt_BR
dc.subjectOn-chip integrationpt_BR
dc.subjectLitografia de dois fótonspt_BR
dc.subjectMicrofabricaçãopt_BR
dc.subjectEmissores brancospt_BR
dc.subjectFotônicapt_BR
dc.titleMicroscale white light emitters fabricated by two-photon polymerization lithography on functional resistpt_BR
dc.typeArtigopt_BR
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